Design a Plasma Generator with Argon Gas Media

Design a Plasma Generator using Argon Gas as a Media

David Suban Koten, Wijono, Rini Nur Hasanah

A substance whose electrons come out of the orbit of each atom is called a plasma. Plasma is ionized gas, and can be prepared by heating the gas or by exposing a fairly strong electromagnetic field using a laser or microwave generator. The main problem in making the plasma reactor is how to design a low pressure vacuum plasma reactor system and produce high plasma discharge.
CCP (capacitively coupled plasma) is a common method used in plasma generation in the industrial world. The CCP method is a method that uses two separate metal electrodes within a fairly close range and is placed inside a reactor. The gas pressure in the reactor can be the same or lower than the atmospheric pressure.
In this research is described how to design high voltage plasma generator, so as to supply direct current voltage (DC) to generate plasma in the reactor room containing low pressure argon gas. In addition to this research also conducted breakdown voltage analysis until found rajahan relationship between breakdown voltage with gas pressure and distance between electrode. It is hoped that the rajahan can be tailored to the curve in accordance with Paschen’s Law and get results close to the ideal curve.